Products Description
Optimizing the amount of waste alkaline water and silicon slag can prepare alkali cementitious materials with good strength development and normal setting time, and effectively reduce the cost of alkali cementitious materials. In addition, it was found that in addition to the C-S-H gel, the hydration products of this alkali cementitious material also included two insoluble zeolite minerals, calcium aluminosilicate Ca(Al2Si2O8) @4H2O, calcium sodium aluminosilicate (Na,Ca)Al3Si5O16.
Products parameters
| Type | Chemical Composition (%) | ||||
| Si | Al | S | P | C | |
| ≤ | |||||
| Silicon Slag 35-38 | 35-38 | 5 | 0.1 | 0.05 | 5 |
| Silicon Slag 38-42 | 38-42 | 5 | 0.1 | 0.05 | 5 |
| Silicon Slag 42-47 | 42-47 | 5 | 0.1 | 0.05 | 5 |
| Silicon Slag 50-55 | 50-55 | 5 | 0.1 | 0.05 | 5 |
| Silicon Slag 55-60 | 55-60 | 5 | 0.1 | 0.05 | 5 |
| Silicon Slag 60-65 | 60-65 | 5 | 0.1 | 0.05 | 5 |
| Size | 10-50mm 90% min/10-70mm 90% min /10-100mm 90% min | ||||
Products cooperation picture
1.Method and device for producing chlorosilane by using organosilicon silicon slag, involving organosilicon technology field. The method of producing chlorosilane by using organosilicon silica slag comprises: using inert gas to produce negative pressure at the silicon slag feed port and the reaction gas feed port by using inert gas in the mixing device, and then making the silica slag and the reaction gas mix evenly in the mixing device, wherein the flow rate of inert gas is 100300m/s, and the reaction gas is hydrogen chloride or chlorine; The mixed gas was reacted at a temperature of 240350°C, initially cooled at a temperature of 130160°C, and then cooled at a temperature of 70130°C to obtain chlorosilane gas. The device for producing chlorosilane by using organosilicon silica slag is a device for implementing the above method, and the full mixing of silica slag and reaction gas is realized by improving the gas-solid mixing device, and then the chlorosilane product is obtained after reaction and impurity removal.
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