Classification by Purity Grade
(1) Industrial-Grade Silicon Powder (98-99% Si)
Composition: 98-99% Si, with impurities like Fe, Al, Ca (<1-2%).
Applications:
Aluminum & steel alloy production (deoxidizer, strengthening agent).
Refractories and ceramics.
Chemical synthesis (silicones, silanes).
(2) High-Purity Silicon Powder (99.5-99.9% Si)
Composition: 99.5-99.9% Si, reduced trace metals (Fe, Al <0.5%).
Applications:
Solar-grade polysilicon feedstock for photovoltaic cells.
Anode material in lithium-ion batteries.
Specialty chemicals and advanced metallurgy.
(3) Ultra-High-Purity Silicon Powder (≥99.99% Si, 4N-6N)
Composition: 99.99% (4N) to 99.9999% (6N) purity, minimal dopants.
Applications:
Semiconductor wafers and microelectronics.
Optical fiber manufacturing.
Quantum computing and high-tech research.
Classification by Particle Size
| Type | Particle Size Range | Key Applications |
|---|---|---|
| Coarse Powder | 10-100 mesh (2,000–150 µm) | Metallurgical alloys, refractories. |
| Medium Powder | 100-325 mesh (150–45 µm) | Chemical synthesis, 3D printing. |
| Fine Powder | 325-1,000 mesh (45–10 µm) | Battery anodes, coatings, electronics. |
| Ultrafine/Nano Powder | <10 µm (or <100 nm) | High-performance composites, nanotechnology. |
Classification by Production Method
(1) Milled Silicon Powder
Produced by mechanical grinding/crushing of silicon metal lumps.
Features: Irregular particle shapes, cost-effective.
Uses: General industrial applications (alloys, chemicals).
(2) Atomized Silicon Powder
Made via gas/water atomization, creating spherical particles.
Features: High flowability, uniform size distribution.
Uses: Additive manufacturing (3D printing), powder metallurgy.
(3) Chemical Vapor Deposition (CVD) Powder
Ultra-high-purity powder synthesized via CVD or plasma processes.
Features: Nanoparticles, minimal impurities.
Uses: Semiconductors, advanced electronics.
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