High-temperature synthesis method for producing silicon carbide
Silicon carbide process flow: Ultra-high temperature environment: Heating to more than 2500℃ through plasma or arc to achieve instantaneous reaction. Rapid synthesis: The reaction time is shortened to several hours, and high-purity SiC is directly generated.
Advantages: The product has high purity (>99.9%) and excellent crystal structure.
There are no intermediate products, which is suitable for the preparation of nano-scale SiC. Disadvantages: Expensive equipment and extremely high energy consumption. The technology is difficult and difficult to apply on a large scale. Application: High-end fields such as semiconductors and optical coatings. Other processes: Chemical vapor deposition (CVD): used for thin film or single crystal SiC, the cost is extremely high. Sol-gel method: suitable for small batches of nano-SiC in the laboratory, and industrialization is difficult.
silicon carbide parameters
|
Trademark |
ZhenAn |
|
Product |
Silicon Carbide |
| Particle Size | Abrasive |
| Refractory Size | 0-1mm 0-10mm 0-100mm |

how to place order
A: Buyer send enquiry →get silicon carbide quotation → order confirmation→ Buyer arrange 30% deposit → Production started upon receipt of deposit→ Strict inspection during production → Buyer arrange balance payment→ Packing → Delivery as per trade terms
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