High Level Material Silicon Metal 97

Silicon metal 97 is widely used in the contact between source, drain and gate and metal electrode in microelectronic devices, and is one of the key materials for the preparation of nano integrated circuits. It can also be used for phase composition, interface reaction and formation mechanism of functional metal silicide for semiconductor integrated circuits, as well as thermal evaporation, ion implantation, sputter deposition, molecular beam epitaxy and other preparation technologies.

1.The direct current arc powder method was used to shoot spectroscopy in argon atmosphere, eliminate the interference of silicon band, and beryllium was used as the internal standard to directly determine 12 impurity elements in silicon metal 97, which was simpler to operate, faster and less reagent consumption than chemical spectrometry. Compared with chemical method and spectrophotometry, it can determine 12 elements at the same time, which can better reflect the true content of silicon metal.Silicon metal was successfully prepared by carbon-thermal reduction of rice husk ash, and the effect of C/SiO2 mass ratio on the preparation of silicon metal was investigated, and the samples were characterized by XRD and Ra-man test methods. The results show that when the mass ratio of C/SiO2 is 1:2.5, the main crystalline phase of the sample is silicon metal, which reduces the cost of silicon metal production and provides a new way for the resource utilization of rice husk ash.

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